A resistance macromodel for deep-submicron process epi-type substrate based on the 2D device simulation is presented.
摘要提种基于二维器件模拟的深亚微米
艺外延
衬底的电阻宏模
。
A resistance macromodel for deep-submicron process epi-type substrate based on the 2D device simulation is presented.
摘要提种基于二维器件模拟的深亚微米
艺外延
衬底的电阻宏模
。
声明:以上例句、词性分类均由互联网资源自动生成,部分未经过核,其表达内容亦不代表本软件的观点;若发现问题,欢迎向我们指正。